Title :
Residual Layer Distribution on Embossing Process for Photonic Devices
Author :
Choi, Chul-Hyun ; Lee, Min Woo ; Sung, Jun-Ho ; Kim, Bo-Soon ; Lee, Seung-Gol ; O, Beom-Hoan
Author_Institution :
Sch. of Inf. & Commun. Eng., INHA Univ., Incheon
Abstract :
We report on the behavior and effect of the residual layer left on the substrate after embossing process for the fabrication of photonic devices. The PDMS material was used as mold, and thermal and UV curable polymers was adapted for the fabrication of demultiplexer and optical power splitter, respectively.
Keywords :
demultiplexing equipment; embossing; integrated optics; optical beam splitters; optical fabrication; optical polymers; PDMS material; UV curable polymers; demultiplexer; embossing process; optical power splitter; photonic devices; residual layer distribution; thermal curable polymers; Costs; Embossing; Mass production; Microstructure; Optical device fabrication; Optical devices; Optical materials; Optical polymers; Optical waveguides; Resists;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391422
