DocumentCode :
2247597
Title :
Main technological causes and some mechanisms of high power GTO´s failures
Author :
Khatir, Z. ; Skiredj, J. ; Lallemand, R.
Author_Institution :
INRETS-LTN, France
fYear :
1994
fDate :
26-28 Oct 1994
Firstpage :
319
Lastpage :
324
Abstract :
The necessity to compare the manufacturing qualities and their evolution on the electrical performances and reliability point of view requires these device valuations. The main neatness and manufacturing defects which can cause GTO thyristor failures or at least their electrical performance deterioration are described and discussed. Neatness defects generally encountered are due to the presence of metallic impurities which could lead to gate cathode short-circuits whereas manufacturing defects are linked to the fineness and care of device realization. The performance improvement of high power GTOs requires more and more technologies and realization care near the microelectronics ones. Some design choices are discussed as regards their corresponding electrical performances. Finally GTO failures observed at the INRETS laboratory are discussed on the basis of the experimental measurements
Keywords :
crystal defects; failure analysis; impurities; manufacture; thyristors; GTO thyristor failures; INRETS laboratory; electrical performance deterioration; electrical performances; gate cathode short-circuits; high power GTO failures; manufacturing defects; metallic impurities; neatness defects; reliability;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Power Electronics and Variable-Speed Drives, 1994. Fifth International Conference on
Conference_Location :
London
Type :
conf
DOI :
10.1049/cp:19940984
Filename :
341598
Link To Document :
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