• DocumentCode
    2248191
  • Title

    Resolution of 1:1 electron stepper lithography based on patterned cold cathode

  • Author

    Hongo, H. ; Ochiai, Y. ; Kawaura, H.

  • Author_Institution
    Fundamental Res. Labs., NEC Corp., Tsukuba, Japan
  • fYear
    2001
  • fDate
    Oct. 31 2001-Nov. 2 2001
  • Firstpage
    46
  • Lastpage
    47
  • Abstract
    Feasibility of 1:1 electron stepper lithography based on a patterned cold cathode is investigated. The beam spread of electrons emitted from a metal-insulator-semiconductor (MIS) cold cathode was estimated to be approximately 23 nm. Therefore, the electron stepper lithography method should achieve a resolution below 50 nm.
  • Keywords
    MIS devices; cathodes; electron beam lithography; 50 nm; electron beam spread; electron stepper lithography; patterned MIS cold cathode; resolution; Acceleration; Cathodes; Electron beams; Electron emission; Energy resolution; Gold; Lithography; Magnetic fields; Metal-insulator structures; National electric code;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2001 International
  • Conference_Location
    Shimane, Japan
  • Print_ISBN
    4-89114-017-8
  • Type

    conf

  • DOI
    10.1109/IMNC.2001.984061
  • Filename
    984061
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2248191