DocumentCode :
2248383
Title :
Ion clearing and photoelectron production in the 200 MeV SXLS ring
Author :
Halama, H. ; Bozoki, Eva
Author_Institution :
Brookhaven Nat. Lab., Upton, New York, NY, USA
fYear :
1991
fDate :
6-9 May 1991
Firstpage :
2313
Abstract :
The design of the SXLS (Superconducting X-ray Lithography Source) clearing system and its behavior are presented. In normal 200 MeV operation, clearing electrode current is dominated by photoelectrons. Clearing electrodes appear essentially only in several locations but not in the dipoles. The effect of clearing voltage on the tune and the beam profile is also discussed.<>
Keywords :
beam handling equipment; beam handling techniques; electron accelerators; synchrotrons; 200 MeV SXLS ring; Superconducting X-ray Lithography Source; beam profile; clearing electrode current; clearing system; clearing voltage; dipoles; ion clearing; photoelectron production; tune; Coaxial cables; Current measurement; Electrodes; Electrons; Laboratories; Production; Strips; Superconducting magnets; Synchrotron radiation; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Particle Accelerator Conference, 1991. Accelerator Science and Technology., Conference Record of the 1991 IEEE
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0135-8
Type :
conf
DOI :
10.1109/PAC.1991.165264
Filename :
165264
Link To Document :
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