Title :
A new inspection method for PSM on DUV inspection light source
Author :
Isomura, I. ; Tsuchiya, H. ; Sugihara, S. ; Yamashita, K. ; Tabata, M.
Author_Institution :
Adv. LSI Technol. Lab., Toshiba Corp., Kawasaki, Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
For the 130 nm generation, the Phase Shift Mask (PSM) is expected to be widely used. Moreover, demand for higher transmission PSM is increasing and a mask inspection system with high detection sensitivity for these masks is also required. In this paper, a new inspection method to improve defect detection sensitivity for a PSM in the DUV inspection system is discussed.
Keywords :
automatic optical inspection; phase shifting masks; sensitivity; ultraviolet lithography; 130 nm; DUV inspection light source; PSM inspection system; acquisition image data; deep UV light source; defect detection sensitivity; high detection sensitivity; mask pattern; phase shift mask; reference image data; Chromium; Circuits; Filters; Glass; Image databases; Image edge detection; Inspection; Large scale integration; Light sources; Noise level;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984070
