Influence of thermal properties of polymers on NanoImprint Lithography performance

Author

Perret, C. ; Gourgon, C. ; Micouin, G. ; Grolier, J.P.E.

Author_Institution

Lab. des Technol. de la Microelectronique, CNRS, Grenoble, France

fYear

2001

fDate

Oct. 31 2001-Nov. 2 2001

Firstpage

98

Lastpage

99

Abstract

Nanoimprint lithography (NIL) is a promising technique to obtain nanometer scale features on large size wafers. The patterns defined in a silicon mold are replicated by pressing a polymer film at high temperature. Previous studies have been mostly devoted to PMMA imprinting. Due to the low etch resistance of this polymer, a lift off step is needed to be able to transfer the patterns by plasma etching,. In this paper, we present results obtained with different polymers presenting a good etching resistance. They will be compared in terms of printed resolution and thermal properties.

Keywords

nanotechnology; photolithography; polymer films; sputter etching; PMMA; etch resistance; etching resistance; lift off step; nanoimprint lithography; nanometer scale features; plasma etching; polymer film; printed resolution; thermal properties; Chemicals; Etching; Glass; Nanolithography; Plasma temperature; Polymers; Pressing; Printing; Resists; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2001 International

Conference_Location

Shimane, Japan

Print_ISBN

4-89114-017-8

Type

conf

DOI

10.1109/IMNC.2001.984107

Filename

984107