Title :
Damage resistant and low stress EUV multilayer mirrors
Author :
Feigl, T. ; Yulin, S. ; Kuhlmann, T. ; Kaiser, N.
Author_Institution :
Fraunhofer-Institut fur Angewandte Optik und Feinmechanik, Jena, Germany
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
Apart from Mo/Si multilayers, we focused our interest on Mo/sub 2/C/Si multilayer mirrors. The mirrors were designed for normal incidence reflection at about 13 nm wavelength. The multilayer mirrors were deposited by dc magnetron sputtering. X-ray scattering, transmission electron microscopy, atomic force microscopy, mechanical stress measurement and chemical analysis were used for the characterization of the multilayer structures. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation.
Keywords :
X-ray scattering; atomic force microscopy; internal stresses; mirrors; molybdenum; molybdenum alloys; optical multilayers; reflectivity; silicon; sputter deposition; transmission electron microscopy; ultraviolet lithography; 13 nm; Mo-Si; Mo/Si multilayers; Mo/sub 2/C-Si; Mo/sub 2/C/Si multilayer mirrors; X-ray scattering; atomic force microscopy; chemical analysis; damage resistance; dc magnetron sputtering; low stress EUV multilayer mirrors; mechanical stress measurement; multilayer degradation; normal incidence reflection; post-deposition thermal treatment; residual compressive stress; synchrotron radiation; thermal stability; transmission electron microscopy; Atomic force microscopy; Atomic measurements; Force measurement; Magnetic multilayers; Mirrors; Nonhomogeneous media; Reflection; Stress; Transmission electron microscopy; Wavelength measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984123
