Title :
Nano-imprint lithography using replicated mold by Ni electro plating
Author :
Hirai, Y. ; Harada, S. ; Isaka, S. ; Kobayashi, M. ; Tanaka, Y.
Author_Institution :
Dept. of Mech. Syst. Eng., Osaka Prefecture Univ., Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
In this work, we demonstrate mold replication with high aspect ratio patterns by Ni electro plating. Using the replicated mold, nano imprint lithography has been demonstrated.
Keywords :
electroplating; lithography; moulding; nanotechnology; nickel; Ni; Ni electroplating; high aspect ratio structure; mold replication; nano-imprint lithography; Current density; Lithography; Mechanical systems; Nickel; Research and development; Resists; Rough surfaces; Surface roughness; Systems engineering and theory; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984150
