DocumentCode
2250345
Title
Nano-imprint lithography using replicated mold by Ni electro plating
Author
Hirai, Y. ; Harada, S. ; Isaka, S. ; Kobayashi, M. ; Tanaka, Y.
Author_Institution
Dept. of Mech. Syst. Eng., Osaka Prefecture Univ., Japan
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
182
Lastpage
183
Abstract
In this work, we demonstrate mold replication with high aspect ratio patterns by Ni electro plating. Using the replicated mold, nano imprint lithography has been demonstrated.
Keywords
electroplating; lithography; moulding; nanotechnology; nickel; Ni; Ni electroplating; high aspect ratio structure; mold replication; nano-imprint lithography; Current density; Lithography; Mechanical systems; Nickel; Research and development; Resists; Rough surfaces; Surface roughness; Systems engineering and theory; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984150
Filename
984150
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