DocumentCode :
2253126
Title :
Ablation study of Cr film by ultrashort double pulses
Author :
Han, Zehua ; Zhou, Changhe ; Dai, Enwen ; Xie, Jin
Author_Institution :
Shanghai Inst. of Opt. & Fine Mech., Chinese Acad. of Sci., Shanghai
fYear :
2007
fDate :
26-31 Aug. 2007
Firstpage :
1
Lastpage :
2
Abstract :
Ablations of Cr film on fused silica with ultrashort double pulses were investigated. Periodic microripple structures were formed on the Cr film after irradiating by trains of double laser pulses. Experimental results should be helpful for us to understand the electron phonon relaxation time for femtosecond laser micromachining.
Keywords :
chromium; high-speed optical techniques; laser ablation; laser beam machining; thin films; Cr; Cr film; double laser pulses; electron phonon relaxation time; femtosecond laser micromachining; fused silica; laser ablation; periodic microripple structures; ultrashort double pulses; Chromium; Delay; Laser ablation; Micromachining; Optical films; Optical pulses; Scanning electron microscopy; Silicon compounds; Ultrafast electronics; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
Type :
conf
DOI :
10.1109/CLEOPR.2007.4391780
Filename :
4391780
Link To Document :
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