Micro flow patterns on demand using surface-chemistry technology

Author

Winky Lap Wing Hau ; Trau, D.W. ; Sucher, N.J. ; Man Wong ; Zohar, Y.

Author_Institution

Dept. of Mech. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China

fYear

2002

fDate

24-24 Jan. 2002

Firstpage

475

Lastpage

478

Abstract

A new technology to pattern surface charges, either negatively or positively, using a standard photolithography process is introduced. Unlimited flow patterns can be generated under an externally applied electric field by electro-osmotic and electrophoretic driving forces to enable fine control of fluid motion in microfluidic devices. Two basic flows, shear and vortical, have been realized experimentally to demonstrate the tremendous potential of this technology, especially in analytical microsystems for genomics or cell biology.

Keywords

electrophoresis; microfluidics; photolithography; shear flow; surface chemistry; vortices; analytical microsystems; electro-osmotic driving forces; electrophoretic driving forces; externally applied electric field; fluid motion; micro flow patterns; shear flows; standard photolithography process; surface chemistry technology; vortical flows; Biotechnology; Chemical technology; Coatings; Glass; Lithography; Microfluidics; Micropumps; Silicon compounds; Substrates; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on

Conference_Location

Las Vegas, NV, USA

ISSN

1084-6999

Print_ISBN

0-7803-7185-2

Type

conf

DOI

10.1109/MEMSYS.2002.984305

Filename

984305