DocumentCode :
2255421
Title :
Large area CVD monolayer graphene for nanoelectronics: Device performance and analysis
Author :
Nayfeh, Osama M. ; Dubey, Madan
Author_Institution :
Sensors & Electron Devices Directorate, United States Army Res. Lab., Adelphi, MD, USA
fYear :
2010
fDate :
19-22 Dec. 2010
Firstpage :
232
Lastpage :
235
Abstract :
Graphene transistors using large area CVD monolayer graphene are constructed and examined. Back-gated devices with exposed graphene channels are characterized to shed light on some of the apparent doping and transport effects that could impact the device performance. Electrical measurements under vacuum and soft-anneal conditions are used to modulate the effective doping density and carrier mobility for both electrons and holes. A good agreement between measurements and a simple drift-diffusion model is obtained when modeling this CVD graphene with a net p-type doping and asymmetric electron/hole mobility. An extracted mean-free path for scattering suggests the presence of large levels of Coulomb and short-range scattering which could be limiting the mobility in this doped material. The results are of importance for understanding the potential of large-area CVD graphene for use in future radiofrequency devices.
Keywords :
CVD coatings; annealing; doping profiles; electron mobility; field effect transistors; graphene; hole mobility; monolayers; nanoelectronics; C; asymmetric electron/hole mobility; carrier mobility; doping effects; drift-diffusion model; effective doping density; electrical measurements; graphene channels; graphene transistors; large area CVD monolayer graphene; mean-free path; nanoelectronics; net p-type doping; soft-anneal conditions; transport effects; vacuum conditions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics (ICM), 2010 International Conference on
Conference_Location :
Cairo
Print_ISBN :
978-1-61284-149-6
Type :
conf
DOI :
10.1109/ICM.2010.5696125
Filename :
5696125
Link To Document :
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