Title :
Compact model for short and ultra thin symmetric double gate
Author :
Abo-Elhadeed, Ahmed F. ; Fikry, Wael
Abstract :
In this paper we propose a new model based on an analytical model for undoped symmetric double gate MOSFETs introduced by Chenming Hu et al. The proposed model targets to include the quantum confinement and the most important short channel effects. The new model results were compared with a device simulator results to validate the proposed modifications. The proposed model introduces low fitting error reaches to 1% for ultra thin and short channel double gate transistors.
Keywords :
MOSFET; semiconductor device models; fitting error; quantum confinement; short channel double gate transistors; short channel effects; ultra thin double gate transistors; ultrathin symmetric double gate; undoped symmetric double gate MOSFET; Analytical models; Fitting; Lead; Logic gates; MOSFET circuits; Silicon; Compact model; double gate; quantum confinement; short channel effects;
Conference_Titel :
Microelectronics (ICM), 2010 International Conference on
Conference_Location :
Cairo
Print_ISBN :
978-1-61284-149-6
DOI :
10.1109/ICM.2010.5696130