• DocumentCode
    2257779
  • Title

    Post-placement temperature reduction techniques

  • Author

    Liu, Wei ; Nannarelli, Alberto ; Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo

  • Author_Institution
    Tech. Univ. of Denmark, Lyngby, Denmark
  • fYear
    2010
  • fDate
    8-12 March 2010
  • Firstpage
    634
  • Lastpage
    637
  • Abstract
    With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit´s area.
  • Keywords
    integrated circuit design; temperature; thermal management (packaging); STM technology; hotspots; post placement temperature reduction technique; size 65 nm; temperature gradient; thermal aware design flow; whitespace; Circuit testing; Delay; Energy management; Integrated circuit interconnections; Integrated circuit technology; Switching circuits; Temperature; Thermal management; Timing; Uncertainty;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
  • Conference_Location
    Dresden
  • ISSN
    1530-1591
  • Print_ISBN
    978-1-4244-7054-9
  • Type

    conf

  • DOI
    10.1109/DATE.2010.5457127
  • Filename
    5457127