DocumentCode :
2262592
Title :
Reconstruction phase transition α(2×4) <-> β(2×4) on [001] GaAs surface
Author :
Dmitriev, Dmitriy V. ; Galitsyn, Yuriy G. ; Mansurov, Vladimir G. ; Toropov, Alexander I.
Author_Institution :
Inst. of Semicond. Phys. SB RAS, Novosibirsk State Tech. Univ., Russia
fYear :
2005
fDate :
1-5 July 2005
Firstpage :
32
Lastpage :
33
Abstract :
One of the basic and studied problems in molecular beam epitaxy is the question about the nucleation and subsequent lateral growth of initial nucleus on the surface. In this study MBE equipment was used with solid state sources of materials. The RHEED system was applied to get the diffraction patterns on reflection. The changing RHEED patterns determine the surface reconstruction and tracks the reconstructional transition. The [001] GaAs substrates with dimensions 3 × 3 mm 2 were studied.
Keywords :
III-V semiconductors; gallium arsenide; molecular beam epitaxial growth; nucleation; phase transformations; reflection high energy electron diffraction; diffraction patterns; molecular beam epitaxy; nucleation; phase transition reconstruction; reflection high energy electron diffraction; semiconductor surface; Gallium arsenide; Geometry; Molecular beam epitaxial growth; Nominations and elections; Optical reflection; Physics; Solid state circuits; Substrates; Surface reconstruction; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2005. Proceedings. 6th Annual. 2005 International Siberian Workshop and Tutorials on
ISSN :
1815-3712
Print_ISBN :
5-7782-0491-4
Type :
conf
DOI :
10.1109/SIBEDM.2005.195573
Filename :
1523178
Link To Document :
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