Title :
Breakthrough in prototyping lead time by use of a photomask control plan
Author :
Osborne, P. ; Visser, Joost
fDate :
30 Sept.-2 Oct. 2003
Abstract :
To reduce prototype lead times Philips Semiconductors has introduced the Flying Dutchman (FD) concept in its 0.18 μm process technology. Based on industry-common methods, FD mainly discriminates itself by also removing virtually all in-line litho CD and overlay measurements from the process-flow, enabled by the use of high-quality photomasks that give predictable on-wafer results. A photomask control plan ensures that two or more of these photomasks can be obtained per day from our commercial mask vendor. As a result, FD reduces waferfab cycle-time to 0.35 days per maskstep.
Keywords :
lithography; masks; 0.18 micron; 0.35 day; Flying Dutchman concept; Philips semiconductors; photomask; prototyping lead time; wafer; Assembly; Lead compounds; Lead time reduction; Manufacturing processes; Optical control; Optical design; Prototypes; Semiconductor device manufacture; Silicon; Testing;
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
Print_ISBN :
0-7803-7894-6
DOI :
10.1109/ISSM.2003.1243230