DocumentCode :
2265293
Title :
Electrothermal behavior of highly-symmetric three-finger bipolar transistors
Author :
La Spina, L. ; d´Alessandro, V. ; Russo, S. ; Rinaldi, N. ; Nanver, L.K.
Author_Institution :
Lab. of Electron. Components, Technol., & Mater. (ECTM), Delft Univ. of Technol., Delft, Netherlands
fYear :
2009
fDate :
12-14 Oct. 2009
Firstpage :
21
Lastpage :
24
Abstract :
Design guidelines are established for improving the electrothermal stability of multifinger bipolar transistors as a result of experiments and simulations conducted on three-finger silicon-on-glass BJTs with selfheating and mutual thermal resistances varying over a large range of values, depending on silicon area, presence of heatspreaders, isolation and distance between the fingers. A rotational-symmetric topography that ensures a high level of symmetry between the individual emitters is proposed to achieve a significant enlargement of the safe operating area as compared to the more conventional parallel-finger designs.
Keywords :
bipolar transistors; stability; thermal resistance; BJT; bipolar transistors; design guidelines; electrothermal behavior; electrothermal stability; rotational-symmetric topography; silicon-on-glass; thermal resistance; Bipolar transistors; Electrothermal effects; Fingers; Guidelines; Resistance heating; Silicon; Surfaces; Thermal conductivity; Thermal resistance; Thermal stability; Aluminum nitride (AlN); bipolar junction transistors (BJTs); electrothermal effects; heatspreaders; multifinger device; safe operating area; selfheating; silicon-on-glass (SOG); thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
Conference_Location :
Capri
ISSN :
1088-9299
Print_ISBN :
978-1-4244-4894-4
Electronic_ISBN :
1088-9299
Type :
conf
DOI :
10.1109/BIPOL.2009.5314145
Filename :
5314145
Link To Document :
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