Fabrication of channel and wedge plasmon polarition devices by combined UV and nanoimprint lithography

Author

Nielsen, Rasmus B. ; Boltasseva, Alexandra ; Kristensen, Anders ; Bozhevolnyi, Sergey I. ; Volkov, Valentyn S. ; Cuesta, Irene Fernandez ; Klukowska, Anna

Author_Institution

Dept. of Commun., Tech. Univ. of Denmark, Lyngby

fYear

2008

fDate

4-9 May 2008

Firstpage

1

Lastpage

2

Abstract

We present a large-scale compatible fabrication method for channel and wedge plasmon polariton waveguides. Optical characterization of fabricated devices using SNOM shows sub-wavelength confinement and propagation lengths in the hundreds of microns.

Keywords

integrated optoelectronics; large scale integration; nanolithography; near-field scanning optical microscopy; optical fabrication; optical testing; optical waveguides; polaritons; soft lithography; surface plasmons; ultraviolet lithography; wafer-scale integration; SNOM; UV lithography; channel plasmon polariton waveguides; nanoimprint lithography; optical characterization; standard planar cleanroom processes; sub-wavelength confinement; wafer-scale fabrication method; wave propagation lengths; wedge plasmon polariton device fabrication; Geometry; Nanolithography; Nanotechnology; Optical device fabrication; Optical devices; Optical fiber polarization; Optical surface waves; Optical waveguides; Plasmons; Silicon; (240.6680) Surface plasmons; (250.5300) Photonic integrated circuits;

fLanguage

English

Publisher

iet

Conference_Titel

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Conference_Location

San Jose, CA

Print_ISBN

978-1-55752-859-9

Type

conf

Filename

4572982