• DocumentCode
    2271968
  • Title

    3D-IC BISR for stacked memories using cross-die spares

  • Author

    Chi, Chun-Chuan ; Chou, Yung-Fa ; Kwai, Ding-Ming ; Hsiao, Yu-Ying ; Wu, Cheng-Wen ; Hsing, Yu-Tsao ; Denq, Li-Ming ; Lin, Tsung-Hsiang

  • Author_Institution
    Dept. of Electr. Eng., Nat. Tsing-Hua Univ., Hsinchu, Taiwan
  • fYear
    2012
  • fDate
    23-25 April 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    3D ICs based on Through-Silicon-Vias (TSVs) enable the stacking of logic and memory dies to manufacture chips with higher performance, lower power, and smaller form factor. To improve the yield of the memory dies in 3D ICs, this paper proposes a Built-In Self-Repair (BISR) architecture which allows the sharing of spares between different layers of dies. The corresponding pre-bond (before the memory dies are bonded together) and post-bond (after the memory dies are bonded together) test flow is presented as well. In order to maximize the yield gain introduced by the cross-die spares, a die matching algorithm is proposed to determine which dies should be stacked together, so that the spare sharing can be most efficient. Experimental results show that the area overhead of the proposed BISR circuit is only 2.43%, which can be smaller if larger logic and memory dies are adopted, and the yield gain achieved by cross-die spare sharing can be up to 23%.
  • Keywords
    built-in self test; integrated circuit testing; integrated circuit yield; three-dimensional integrated circuits; 3D-IC BISR; BISR architecture; BISR circuit; TSV; built-In self-repair; chip manufacture; cross-die spares; die matching algorithm; logic dies; memory dies; post-bond; prebond; spare sharing; stacked memories; test flow; through-silicon-vias; yield gain; Built-in self-test; Maintenance engineering; Memory management; Random access memory; Three dimensional displays; Vectors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Design, Automation, and Test (VLSI-DAT), 2012 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    PENDING
  • Print_ISBN
    978-1-4577-2080-2
  • Type

    conf

  • DOI
    10.1109/VLSI-DAT.2012.6212621
  • Filename
    6212621