DocumentCode
227391
Title
Fractal study of the sputtered contact surface relief
Author
Moos, Evgeny N. ; Borisovskiy, Petr A.
Author_Institution
Ryazan State Univ. named for S.A. Yesenin, Ryazan, Russia
fYear
2014
fDate
June 30 2014-July 4 2014
Firstpage
1
Lastpage
1
Abstract
The ion-plasma treatment technology for the contact is important one on new stage development [1]. The fractal dimension of the contact surface after this undergoing were studied by atomic force microscopy (AFM). The influence on the power value change in the morphology of the surface relief are shown.
Keywords
atomic force microscopy; fractals; ion beam applications; plasma materials processing; sputtering; surface morphology; AFM; atomic force microscopy; fractal dimension; ion-plasma treatment technology; power value change; sputtered contact surface relief; surface relief morphology; Discharges (electric); Fractals; Surface discharges; Surface morphology; Surface topography; Surface treatment; Three-dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electron Sources Conference (IVESC), 2014 Tenth International
Conference_Location
St. Petersburg
Print_ISBN
978-1-4799-5770-5
Type
conf
DOI
10.1109/IVESC.2014.6892035
Filename
6892035
Link To Document