DocumentCode :
2274431
Title :
PhotoPDMS: Photodefinable PDMS for Rapid Prototyping
Author :
Jothimuthu, Preetha ; Bhagat, Ali Asgar S ; Papautsky, Ian
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Cincinnati, Cincinnati, OH
fYear :
2008
fDate :
13-16 July 2008
Firstpage :
183
Lastpage :
186
Abstract :
In this paper, we present a new and simple method of patterning polydimethylsiloxane (PDMS) directly under normal ambient light. This new photodefinable PDMS (photoPDMS) was applied to simplify otherwise complex microfabrication procedures such as fabrication of multi- layered microfluidic devices and patterning free-standing thin films for shadow masking on planar and non-planar surfaces. This new photoPDMS material offers numerous advantages including: direct patterning eliminating the need for a master template; ability to process under ambient light eliminating the need for sensitive lighting; and finally all advantages of PDMS including low cost and simple fabrication enabling rapid prototyping.
Keywords :
elastomers; lab-on-a-chip; microfluidics; optical polymers; rapid prototyping (industrial); ambient light; benzophenone photoinitiator; elastomer; lab-on-a-chip process; low cost fabrication; microfluidic devices; patterning; photodefinable polydimethylsiloxane; rapid prototyping; Biomedical optical imaging; Costs; Lab-on-a-chip; Lithography; Microfluidics; Optical device fabrication; Polymers; Prototypes; Resists; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location :
Louisville, KY
Print_ISBN :
978-1-4244-2484-9
Electronic_ISBN :
978-1-4244-2485-6
Type :
conf
DOI :
10.1109/UGIM.2008.54
Filename :
4573232
Link To Document :
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