DocumentCode
227454
Title
Mechanisms for the effect of residual pressure on field emission in vacuum
Author
Almaksour, Khaled ; Teste, Philippe ; Kirkpatrick, Michael J. ; Dessante, Philippe ; Odic, Emmanuel
Author_Institution
LGEP, Univ. Paris 6 & 11, Gif-sur-Yvette, France
fYear
2014
fDate
25-29 May 2014
Firstpage
1
Lastpage
1
Abstract
Summary form only given. It has been widely reported that injection of gas into high voltage vacuum insulation systems is effective for the reduction of field emission; this technique is sometimes called gas conditioning1. While it is commonly thought that the responsible mechanism is ionic bombardment of microscopic field emitter structures, there still exists debate on this point. In this presentation, we will compare and contrast several competing ideas for the mechanism in light of measurements of field emission on the order of pA to μA in the presence of different gases over several orders of magnitude of pressure. These mechanisms include gas adsorption induced by high electric field, ionic bombardment leading to erosion of field emitters, and ionic bombardment leading to implantation of species within the cathode material. Implications of these issues on the design of certain accelerator structures will then be discussed.
Keywords
cathodes; field emitter arrays; vacuum insulation; cathode material; field emission; gas adsorption; high electric field; high voltage vacuum insulation systems; ionic bombardment; microscopic field emitter structures; residual pressure; Elementary particle vacuum; Gases; Insulation; Microscopy; Pressure measurement; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location
Washington, DC
Print_ISBN
978-1-4799-2711-1
Type
conf
DOI
10.1109/PLASMA.2014.7012372
Filename
7012372
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