• DocumentCode
    2275155
  • Title

    Explicit approximation of surface potential for fully-depleted polysilicon thin-film transistors

  • Author

    Ma, Xiaoyu ; Deng, Wanling ; Huang, Lunkai

  • Author_Institution
    Dept. of Electron. Eng., Jinan Univ., Guangzhou, China
  • fYear
    2012
  • fDate
    14-15 May 2012
  • Firstpage
    164
  • Lastpage
    167
  • Abstract
    A physical-based and explicit calculation of surface potential for fully-depleted polysilicon thin-film transistors is proposed in this paper. For fully-depleted devices, not only the surface potential in the channel, but also the potential at the back surface are solved analytically. An exponential density of defect states is taken into account. The proposed scheme to calculate the surface potential at both interfaces is derived by using the Lambert W function, which greatly improves computational efficiency and is critical in circuit simulation. The effects of trap state density and film thickness on surface potential was discussed. It is verified that the proposed scheme accurately reproduces the numerical results.
  • Keywords
    approximation theory; circuit simulation; defect states; elemental semiconductors; semiconductor thin films; silicon; surface potential; thin film transistors; Lambert function; Si; circuit simulation; computational efficiency; defect states; explicit approximation; film thickness; fully-depleted devices; fully-depleted polysilicon thin-film transistors; physical-based calculation; state density; surface potential; Abstracts; Films; Insulators; Logic gates; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2012 12th International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4673-1258-5
  • Electronic_ISBN
    978-1-4673-1256-1
  • Type

    conf

  • DOI
    10.1109/IWJT.2012.6212834
  • Filename
    6212834