DocumentCode
2275155
Title
Explicit approximation of surface potential for fully-depleted polysilicon thin-film transistors
Author
Ma, Xiaoyu ; Deng, Wanling ; Huang, Lunkai
Author_Institution
Dept. of Electron. Eng., Jinan Univ., Guangzhou, China
fYear
2012
fDate
14-15 May 2012
Firstpage
164
Lastpage
167
Abstract
A physical-based and explicit calculation of surface potential for fully-depleted polysilicon thin-film transistors is proposed in this paper. For fully-depleted devices, not only the surface potential in the channel, but also the potential at the back surface are solved analytically. An exponential density of defect states is taken into account. The proposed scheme to calculate the surface potential at both interfaces is derived by using the Lambert W function, which greatly improves computational efficiency and is critical in circuit simulation. The effects of trap state density and film thickness on surface potential was discussed. It is verified that the proposed scheme accurately reproduces the numerical results.
Keywords
approximation theory; circuit simulation; defect states; elemental semiconductors; semiconductor thin films; silicon; surface potential; thin film transistors; Lambert function; Si; circuit simulation; computational efficiency; defect states; explicit approximation; film thickness; fully-depleted devices; fully-depleted polysilicon thin-film transistors; physical-based calculation; state density; surface potential; Abstracts; Films; Insulators; Logic gates; Substrates; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location
Shanghai
Print_ISBN
978-1-4673-1258-5
Electronic_ISBN
978-1-4673-1256-1
Type
conf
DOI
10.1109/IWJT.2012.6212834
Filename
6212834
Link To Document