• DocumentCode
    2275587
  • Title

    Hall resistance plateaus in high quality graphene samples at large currents: Toward quantization tests

  • Author

    Bennaceur, K. ; Guignard, J. ; Schopfer, F. ; Poirier, W. ; Glattli, D.C.

  • Author_Institution
    Service de Phys. de l´´Etat Condense, CEA Saclay, Gif-sur-Yvette
  • fYear
    2008
  • fDate
    8-13 June 2008
  • Firstpage
    14
  • Lastpage
    15
  • Abstract
    Graphene Hall bars prepared from exfoliated natural graphite of large size and high quality have been measured in the quantum Hall effect regime. The monolayer Graphene sheet shows Hall quantization robust upon applying very large current. Low longitudinal resistance is found up to 10 muA with finite width h/2e2 Hall plateau at 4.2 K and 16 T. The TiAu/Graphene contact resistance is found low, typically 20 Omega to 50 Omega. The results strongly indicate that Graphene is a promising new material for quantum metrology.
  • Keywords
    contact resistance; gold alloys; graphene; monolayers; quantum Hall effect; titanium alloys; Hall resistance plateaus; TiAu-C; TiAu-graphene contact resistance; graphene Hall bar preparation; high quality graphene samples; magnetic flux density 16 T; monolayer; quantization tests; quantum Hall effect; quantum metrology; resistance 20 ohm to 50 ohm; temperature 4.2 K; Contact resistance; Doping; Electrical resistance measurement; Electrons; Magnetic flux density; Quantization; Robustness; Temperature; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements Digest, 2008. CPEM 2008. Conference on
  • Conference_Location
    Broomfield, CO
  • Print_ISBN
    978-1-4244-2399-6
  • Electronic_ISBN
    978-1-4244-2400-9
  • Type

    conf

  • DOI
    10.1109/CPEM.2008.4574629
  • Filename
    4574629