Modeling of profile effects for large area inductive coupled plasma sources

Summary form only given, as follows. Inductively coupled plasma (ICP) sources are one of the most important high density plasma configurations developed in recent years. Next generation technology requires plasma processing systems with high uniformity over very large areas. We present here results of a comparison between computer modeling and experimental data from the LLNL Large Area ICP Source. The LLNL Source has a 30" diameter and is designed to study 400 mm processing. Computer simulations using the fluid code, INDUCT94, are used to explain variations in the plasma density profile measurements as a function of inductive power, gas pressure, and gas composition. Both argon and N/sub 2/ discharges are considered. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions, and neutrals including effects of both inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effect of pressure and power on the plasma uniformity. High uniformity of the order of several per cent was found to be possible over a 400 mm diameter area.