Title :
High accuracy step-and-repeat uv imprint lithography for wafer level camera master manufacturing
Author :
Kreindl, G. ; Glinsner, T. ; Födisch, R. ; Treiblmayr, D. ; Miller, R.
Author_Institution :
EVGroup, St. Florian, Austria
Abstract :
This work demonstrates unmatched needs for wafer-level camera applications like lateral lens to lens position accuracies of <; ± 200 nm on arbitrary x and y distances as well as optic axes tilt measurements using step and repeat UV-nano imprint lithography.
Keywords :
nanolithography; optical fabrication; photographic lenses; soft lithography; ultraviolet lithography; lateral lens-to-lens position; optic axes tilt measurements; step-and-repeat UV imprint lithography; wafer level camera master manufacturing;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
DOI :
10.1109/NANO.2010.5697762
