• DocumentCode
    2284716
  • Title

    Sheath expansion in two-dimensional Cartesian and cylindrical targets

  • Author

    Hong, M.P. ; Emmert

  • Author_Institution
    Dept. of Nucl. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    204
  • Lastpage
    205
  • Abstract
    Summary form only given, as follows. The transient sheath expansion induced by a voltage pulse applied to two-dimensional targets is simulated numerically with a fluid model. Non-linear sheath expansion due to sheath overlapping in a small cylindrical bore with a finite depth is presented. The sheath expansion inside the bore is enhanced by the initially nonuniform plasma distribution. The angular distribution of the ions impinging on the target surface and the nonuniformity of the incident ion dose are calculated for a cylindrical bore target. A dip of the dose profile, seen earlier for square targets, appears at convex corners of the target. This dip is a numerical artifact, not a real physical phenomenon, mainly caused by false diffusion (numerical diffusion) and inaccurate estimation of the electric field on the corner. By re-orientation of the numerical mesh to suppress false diffusion, the dip effect can be be eliminated effectively in the square target case.
  • Keywords
    numerical analysis; plasma sheaths; plasma simulation; plasma theory; angular distribution; convex corners; cylindrical bore target; cylindrical targets; dip effect; dose profile; electric field; finite depth; fluid model; incident ion dose; initially nonuniform plasma distribution; nonlinear sheath expansion; nonuniformity; numerical artifact; numerical diffusion; numerical mesh; re-orientation; small cylindrical bore; target surface; transient sheath expansion; two-dimensional Cartesian targets; two-dimensional targets; voltage pulse; Boring; Circuit simulation; Conductors; Fault location; Laboratories; Plasma immersion ion implantation; Plasma properties; Plasma sheaths; Plasma simulation; Plasma sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531732
  • Filename
    531732