• DocumentCode
    2286394
  • Title

    Schottky barrier single electron and single hole transistors

  • Author

    Jang, Moongyu ; Jun, Myungsim ; Zyung, Taehyoung ; Park, Youngsam ; Hyun, Younghoon

  • Author_Institution
    NT Res. Dept., Electron. & Telecommun. Res. Inst. (ETRI), Daejeon, South Korea
  • fYear
    2010
  • fDate
    17-20 Aug. 2010
  • Firstpage
    1092
  • Lastpage
    1095
  • Abstract
    Schottky barrier single electron/hole transistor (SB-SET/SB-SHT) are manufactured using erbium-silicide and platinum-silicide as source and drain materials. In room temperature, the manufactured SB-SET and SB-SHT showed typical FET behavior with high drive current, 550 and -376 μA/μm, respectively. At 7 K, these devices showed SET and SHT characteristics. The measured coulomb gaps are about 170 mV for the SB-SET and 220 mV for the SB-SHT. From these, the estimated sizes of the islands are 12.5 and 9.1 nm, respectively. In SB-SET and SB-SHT, high transconductance can be easily achieved because silicided electrode eliminates parasitic resistance. Moreover SB-SET and SB-SHT can be operated as conventional FET and SET/SHT depending on the bias conditions, which is very promising for SET/FET and SHT/FET hybrid applications.
  • Keywords
    Schottky barriers; erbium compounds; field effect transistors; platinum compounds; ErSi; FET behavior; PtSi; SB-SET-SB-SHT; Schottky barrier single-electron-hole transistors; coulomb gaps; drain materials; erbium-silicide; platinum-silicide; silicided electrode; size 12.5 nm; size 9.1 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
  • Conference_Location
    Seoul
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-7033-4
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2010.5697867
  • Filename
    5697867