Title :
A structure controlled nano-porous AR film by high boiling point of organic solvent
Author :
Hyunjong Kim ; Gi Kim, Seong ; Sohn, Hyung Min ; Chai, Kyung-Hoon ; Lee, Joo-won
Author_Institution :
LG Components R&D Center, Ansan, South Korea
Abstract :
The particles was prepared by one step process under the strong acidic condition, starting from tetraethoxysilane (TEOS) in the present of high boiling point of reagent. The resulting solution was applied to a soda-lime glass, followed by drying and sintering process. The crystal structure was controlled by evaporation rate of solvent, which increases a size of pore. The obtained film shows 3% increasing from bare glass by one side coating. The surface morphology was investigated by scanning electron microscopy (SEM). The sintered film shows high scratch resistance against pencil scratch and strong adhesion to substrate.
Keywords :
adhesion; boiling point; crystal structure; drying; evaporation; nanoporous materials; scanning electron microscopy; silicon compounds; sintering; sol-gel processing; surface morphology; thin films; SEM; SiO2; acidic condition; adhesion; crystal structure; drying; high boiling point; nanoporous AR film; organic solvent; pencil scratch; pore size; scanning electron microscopy; scratch resistance; sintering; soda-lime glass; solvent evaporation rate; surface morphology; tetraethoxysilane;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
DOI :
10.1109/NANO.2010.5697878
