DocumentCode :
2291653
Title :
Quantum confinement effect in short-channel Gate-All-Around MOSFETs and its impact on the sensitivity of threshold voltage to process variations
Author :
Wu, Yu-Sheng ; Su, Pin
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear :
2009
fDate :
5-8 Oct. 2009
Firstpage :
1
Lastpage :
2
Abstract :
We have proposed an analytical model for quantum confinement effects in short-channel Gate-All-Around (GAA) MOSFETs. This model accurately predicts the eigen-energy shift and eigen-function modulation caused by the short channel effects in lightly doped GAA devices. It shows that the threshold voltage (Vth) variation due to channel diameter variation is larger than that due to channel length variation because of the significant quantum confinement in ultra-scaled devices. Our model indicates that the channel diameter of GAA MOSFETs can be optimized to reduce the Vth variation.
Keywords :
MOSFET; eigenvalues and eigenfunctions; silicon-on-insulator; channel diameter variation; channel length variation; device model; doped GAA devices; eigen-energy shift; eigen-function modulation; process variations; quantum confinement effect; short-channel gate-all-around MOSFETs; threshold voltage sensitivity; ultrascaled devices; Analytical models; Carrier confinement; Electrons; Electrostatics; MOSFETs; Potential well; Predictive models; Schrodinger equation; Semiconductor device modeling; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2009 IEEE International
Conference_Location :
Foster City, CA
ISSN :
1078-621X
Print_ISBN :
978-1-4244-4256-0
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2009.5318772
Filename :
5318772
Link To Document :
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