Title :
High Resolved Spectra of Pulse High Current Capillary Discharge Plasma
Author :
Schmidt, J. ; Kolacek, K. ; Frolov, O. ; Prukner, V. ; Straus, J.
Author_Institution :
Inst. of Plasma Phys., Acad. of Sci. of the Czech Republic, Prague
Abstract :
We have built two experimental apparatuses CAPEX and CAPEX-U. On both these devices we have observed a very strong amplification of Ne-like argon line at 46.9 nm. However, these devices are not only lasing at 46.9 nm, but they also serve for testing a possibility of amplification at shorter wavelengths (below 20 nm) that have more practical applications (e.g. as a potential source for XUV lithography). CAPEX device is a smaller and less powerful than CAPEX-U facility. On the other hand, this apparatus has higher capillary current rise-rate, which is more desirable for reaching amplification below 20 nm. At present capillary discharge experiments with nitrogen-filled capillary are in progress. High resolved spectra are obtained with the help of McPherson spectrometer. We report not only on the successful operation of the compact "table-top" discharge driven 46.9 nm laser (argon-filled capillary) but also on our chances to achieve amplification at 13.4 nm (nitrogen-filled capillary) based mainly on results of axial soft X-ray spectroscopic measurements.
Keywords :
X-ray spectroscopy; capillarity; discharges (electric); ultraviolet lithography; CAPEX; McPherson spectrometer; XUV lithography; capillary discharge; high resolved spectra; nitrogen-filled capillary; pulse high current capillary discharge plasma; size 46.9 nm; soft X-ray spectroscopic measurements; Argon; Capacitors; Ceramics; Contracts; Plasma devices; Pulse amplifiers; Sparks; Spectroscopy; Voltage; X-ray lasers;
Conference_Titel :
IEEE International Power Modulators and High Voltage Conference, Proceedings of the 2008
Conference_Location :
Las Vegas, NE
Print_ISBN :
978-1-4244-1534-2
Electronic_ISBN :
978-1-4244-1535-9
DOI :
10.1109/IPMC.2008.4743677