Title :
Demonstration of a distributed etched diffraction grating demultiplexer
Author :
Jafari, Amir ; Kirk, Andrew
Author_Institution :
Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, QC, Canada
Abstract :
A compact shallow etched distributed diffraction grating waveguide demultiplexer has been demonstrated in silicon-on-insulator for coarse wavelength demultiplexing applications. The device supports 4 channels with 20nm channel spacing.
Keywords :
channel spacing; demultiplexing; demultiplexing equipment; diffraction gratings; elemental semiconductors; etching; optical communication equipment; optical fabrication; optical planar waveguides; silicon; silicon compounds; silicon-on-insulator; Si-SiO2; channel spacing; coarse wavelength demultiplexing; distributed etched diffraction grating demultiplexer; silicon-on-insulator; waveguide demultiplexer;
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-5368-9
DOI :
10.1109/PHOTONICS.2010.5698894
