Title :
Simulation Of Potentials Created by particulates in RF discharges: residence at the sheath edges
Author :
Tsung, F. ; Trulsen, I. ; Vahedi, V. ; Birdsall, C.K.
Author_Institution :
Univ. of Calif.
Keywords :
Atmospheric modeling; Electrons; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma simulation; Plasma temperature; Radio frequency; Semiconductor process modeling;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695547