Title :
Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
Author :
Carbajo, S. ; Brizuela, F. ; Martz, D.H. ; Alessi, D. ; Wang, Y. ; Marconi, M.C. ; Rocca, J.J. ; Menoni, C.S. ; Sakdinawat, A. ; Anderson, E. ; Goldberg, K.A. ; Attwood, D.T. ; La Fontaine, B.
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
Abstract :
We have developed a compact aerial full-field microscope based on a table-top 13.2 nm wavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.
Keywords :
CCD image sensors; light diffraction; optical microscopes; ultraviolet lithography; Mo-Si; at-wavelength characterization; compact aerial full-field microscope; diffractive optics; extreme ultraviolet lithography masks; laser-based aerial microscope; printing performance;
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-5368-9
DOI :
10.1109/PHOTONICS.2010.5699022
