DocumentCode
230736
Title
Improving the topografiner technology down to nanometer spatial resolution
Author
Zanin, D.A. ; De Pietro, L.G. ; Cabrera, H. ; Kostanyan, A. ; Vindigni, A. ; Pescia, D. ; Ramsperger, U.
Author_Institution
Lab. for Solid State Phys., ETH Zurich, Zurich, Switzerland
fYear
2014
fDate
6-10 July 2014
Firstpage
141
Lastpage
142
Abstract
In Scanning Tunnelling Microscopy (STM) the electrons are confined within the tunneling region, and this limitation has redirected scientists to alternative microscopy techniques, aimed at extracting the electrons away from the tunneling region. The topografiner - strictly speaking a precursor of STM, originally developed at the National Bureau of Standards - is an example. In this paper we report on the latest improvements of the topografiner technology that allow resolving topographic contrast with a lateral resolution down to 7 Å.
Keywords
scanning tunnelling microscopy; tunnelling; STM; nanometer spatial resolution; scanning tunnelling microscopy; topografiner technology; topographic contrast; tunneling region; Electron beams; Iron; Junctions; Microscopy; Spatial resolution; Surface topography; Tunneling; Field Emission; Secondary Electron; Topografiner;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location
Engelberg
Print_ISBN
978-1-4799-5306-6
Type
conf
DOI
10.1109/IVNC.2014.6894818
Filename
6894818
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