DocumentCode :
2318664
Title :
Endurance of Si field emitters prepared by VLS technique
Author :
Mescheryakova, A.L. ; Zhirnov, V.V.
Author_Institution :
Inst. of Crystallogr., Moscow, Russia
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
103
Lastpage :
104
Abstract :
Field emitters, prepared from Si whiskers grown by Vapor-Liquid-Solid (VLS) technique show superior emission performance as compared with other Si-based emitters, due to their shape and high aspect ratio. In this paper the results about the endurance of Si VLS-emitters are first presented. Two types of samples were studied: (1) "tip-on-post" samples for applications as point electron sources and (2) large-area (up to 6 cm) wafer-grown Si FEA. The two types of the samples differ in VLS growth conditions, and as it was found, they have different endurance. The endurance problem can be subdivided in two parts: stability of emitting surface (apex) and endurance (life time) of emitters body during operation and long-term storage.
Keywords :
electron field emission; elemental semiconductors; silicon; vacuum microelectronics; whiskers (crystal); FEA; Si; Si whisker; endurance; field emitter; point electron source; stability; vapor-liquid-solid growth; Coatings; Crystallography; Degradation; Electron sources; Gold; Rough surfaces; Shape; Statistics; Surface morphology; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728662
Filename :
728662
Link To Document :
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