The effects of acid treatment on field emission from diamond films

Author

Yuan, G. ; Han, Lu ; Wang, Xiongfei ; Gu, Chen ; Ji, Hong ; Zhou, T. ; Jiang, H. ; Zhang, B. ; Wang, W. ; Zhao, H. ; Tian, Y. ; Jin, C. ; Chen, H. ; Jin, Y.

Author_Institution

Inst. of Phys., Acad. Sinica, Changchun, China

fYear

1998

fDate

19-24 July 1998

Firstpage

208

Lastpage

209

Abstract

Recently CVD diamond films have emerged as potential cathode materials, but the data are complex and the emission mechanism is not clear. For example, J. W. Glesener and co-workers (1996) reported that emission from diamond films is dependent on doping. Some results show that emission from diamond films follows the FN theory, but some results do not. M.W. Gels and J.C. Twichell (1995) reported that high emission could be obtained at lower electrical fields after surface treatment and doping. Usually surface states and morphology are important parameters so we have tested an acid treatment to change surface morphology and have obtained better emission.

Keywords

CVD coatings; diamond; electron field emission; surface treatment; C; CVD diamond film; Fowler-Nordheim theory; acid treatment; cathode material; field emission; surface morphology; Atomic force microscopy; Cathodes; Physics; Plasma temperature; Semiconductor films; Silicon; Surface morphology; Surface treatment; Voltage; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1998. Eleventh International

Conference_Location

Asheville, NC, USA

Print_ISBN

0-7803-5096-0

Type

conf

DOI

10.1109/IVMC.1998.728722

Filename

728722