Title :
Examination of electron field emission efficiency and homogeneity from CVD carbon-type films
Author :
Biyablin, A.A. ; Kandidov, A.V. ; Pilevskiy, A.A. ; Rakhimov, A.T. ; Samorodov, V.A. ; Seleznev, B.V. ; Suetin, N.V. ; Timofeyev, M.A.
Author_Institution :
Inst. of Nucl. Phys., Moscow State Univ., Russia
Abstract :
This paper reports about investigation of electron emission characteristics of carbon-type films grown by an original CVD method on Si and Mo substrates with the diameter 30 mm. It was shown that films have sufficiently high spatial uniformity of emission sites and emission current density exceeds 900 mA/cm/sup 2/ at the extraction field around 7 V/micron.
Keywords :
CVD coatings; carbon; electron field emission; C; CVD carbon-type films; electron emission characteristics; electron field emission efficiency; emission current density; emission sites; high spatial uniformity; homogeneity; Cathodes; Charge coupled devices; Current density; Displays; Electron emission; Fabrication; Nuclear physics; Phosphors; Pulsed power supplies; Semiconductor films;
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
DOI :
10.1109/IVMC.1998.728735
