DocumentCode :
2320561
Title :
Modeling and simulation of AlxGa/sub 1-x/N negative electron affinity cathodes
Author :
Hatfield, C.W. ; Bilbro, G.L.
Author_Institution :
Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
289
Lastpage :
290
Abstract :
This work predicts the performance of negative electron affinity (NEA) cathodes fabricated with Al/sub x/Ga/sub 1-x/N material. A cathode of a given thickness is designed by specifying the compositional grading and the donor concentration as functions of position, based on available semiconductor data. Electrical operation of these cathodes was simulated by solving standard differential equations which describe semiconductor physics, using a fourth-order Runga-Kutta numerical analysis procedure. The J-V characteristics of the cathode in a vacuum diode were generated by computing the anode voltages corresponding to emitted current densities.
Keywords :
III-V semiconductors; Runge-Kutta methods; aluminium compounds; cathodes; diodes; electron affinity; electron field emission; gallium compounds; vacuum microelectronics; Al/sub x/Ga/sub 1-x/N negative electron affinity cathode; AlGaN; J-V characteristics; Runga-Kutta numerical analysis; compositional grading; differential equation; donor concentration; field emission; model; semiconductor; simulation; vacuum diode; Analytical models; Cathodes; Character generation; Computational modeling; Differential equations; Electrons; Numerical analysis; Physics; Semiconductor diodes; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728761
Filename :
728761
Link To Document :
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