DocumentCode
2321755
Title
Optimisation of growth parameters for photonic crystal structures
Author
Atkinson, P. ; Johnston, M.B. ; Beere, H.E. ; Ritchie, D.A.
Author_Institution
Cavendish Lab., Cambridge Univ., UK
fYear
2002
fDate
15-20 Sept. 2002
Firstpage
153
Lastpage
154
Abstract
The preferential facetting that occurs during regrowth on patterned substrates by MBE, together with the different adatom migration lengths on different facets has been successfully used to provide good 1D confinement following overgrowth on mesas. However, in some instances it is preferable that the initial surface profile remains unmodified during successive growth stages. An example of this is for photonic crystal structures which can be created by patterning the surface with an array of mesas, and then regrowing a sequence of alternating layers of different refractive indices with spatially varying periodicity of order of hundreds of nanometers in both the lateral and growth directions.
Keywords
adsorbed layers; molecular beam epitaxial growth; optical fabrication; photonic crystals; refractive index; surface topography; 1D confinement; MBE; adatom migration lengths; array; growth parameters; growth stages; mesas; optimisation; overgrowth; patterned substrates; periodicity; photonic crystal; photonic crystal structures; preferential facetting; refractive indices; regrowth; surface profile; Anisotropic magnetoresistance; Atomic layer deposition; Etching; Gallium arsenide; Hydrogen; Laboratories; Optical refraction; Photonic crystals; Surface morphology; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-7581-5
Type
conf
DOI
10.1109/MBE.2002.1037805
Filename
1037805
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