• DocumentCode
    2321755
  • Title

    Optimisation of growth parameters for photonic crystal structures

  • Author

    Atkinson, P. ; Johnston, M.B. ; Beere, H.E. ; Ritchie, D.A.

  • Author_Institution
    Cavendish Lab., Cambridge Univ., UK
  • fYear
    2002
  • fDate
    15-20 Sept. 2002
  • Firstpage
    153
  • Lastpage
    154
  • Abstract
    The preferential facetting that occurs during regrowth on patterned substrates by MBE, together with the different adatom migration lengths on different facets has been successfully used to provide good 1D confinement following overgrowth on mesas. However, in some instances it is preferable that the initial surface profile remains unmodified during successive growth stages. An example of this is for photonic crystal structures which can be created by patterning the surface with an array of mesas, and then regrowing a sequence of alternating layers of different refractive indices with spatially varying periodicity of order of hundreds of nanometers in both the lateral and growth directions.
  • Keywords
    adsorbed layers; molecular beam epitaxial growth; optical fabrication; photonic crystals; refractive index; surface topography; 1D confinement; MBE; adatom migration lengths; array; growth parameters; growth stages; mesas; optimisation; overgrowth; patterned substrates; periodicity; photonic crystal; photonic crystal structures; preferential facetting; refractive indices; regrowth; surface profile; Anisotropic magnetoresistance; Atomic layer deposition; Etching; Gallium arsenide; Hydrogen; Laboratories; Optical refraction; Photonic crystals; Surface morphology; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Molecular Beam Epitaxy, 2002 International Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-7581-5
  • Type

    conf

  • DOI
    10.1109/MBE.2002.1037805
  • Filename
    1037805