Title :
Automated In-line Monitoring Of Chemical Assay In Wafer Cleaning Solution
Author :
Takaiwa, S. ; Funabashi, T. ; Yoshii, A. ; Iwata, T.
Author_Institution :
TOKICO Ltd.
Abstract :
The continuous monitoring equipment for the chemical assay of these cleaning solution has been developed. These assay are determined by the electrochemical sensing probes such called as ion selective electrodes. With this method, it is able to measure the concentration of components in the solution by the sensitivity of 0. 1 -1 g/L.
Keywords :
Chemical processes; Chemical sensors; Cleaning; Computerized monitoring; Electrodes; Large scale integration; Manufacturing processes; Probes; Random access memory; Semiconductor device manufacture;
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
DOI :
10.1109/ISSM.1994.729453
