Title :
Fabrication of nano-patterns using quick gel-nanoimprint process
Author :
Araki, Shinji ; Zhang, Min ; Doe, Takahiro ; Lu, Li ; Horita, Masahiro ; Nishida, Takashi ; Ishikawa, Yasuaki ; Uraoka, Yukiharu
Author_Institution :
Grad. Sch. of Mater. Sci., Nara Inst. of Sci. & Technol. (NAIST), Nara, Japan
Abstract :
We investigated a quick patterning using gel-nanoimprint process for zinc oxide (ZnO) thin films. The X-ray diffraction measurement revealed that the ZnO films had wurtzite structure by annealing in the ambient air or oxygen. The ZnO film annealed in oxygen exhibited higher refractive index of 1.92 (at 720 nm for wavelength of light) which is close to that of a conventional ZnO film, whereas that of ZnO film annealed in air atmosphere provided very low value of 1.64. The width of ZnO patterns was in good agreement with that of a polydimethylsiloxane mold.
Keywords :
II-VI semiconductors; X-ray diffraction; annealing; gels; nanofabrication; nanolithography; nanopatterning; soft lithography; thin films; wide band gap semiconductors; zinc compounds; X- ray diffraction measurement; ZnO; annealing; nanopattern fabrication; polydimethylsiloxane mold; quick gel-nanoimprint lithography processing; quick patterning; refractive index; thin film; wavelength 720 nm; wurtzite structure; Annealing; Fabrication; Films; Glass; Lithography; Refractive index; Zinc oxide; nanoimprint lithography; polydimethylsiloxane; sol-gel method; zinc oxide thin film;
Conference_Titel :
Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-4673-0837-3
DOI :
10.1109/IMFEDK.2012.6218583
