• DocumentCode
    2331970
  • Title

    High-resistance ZrN thin film resistor for small and low-cost MMIC switch

  • Author

    Shibata, Masahiro ; Tokuya, Hiroaki ; Yamamoto, Satoshi ; Saimei, Tsunekazu ; Kato, Takatoshi ; Fukura, Tadao

  • Author_Institution
    Murata Manuf. Co., Ltd., Nagaokakyo, Japan
  • fYear
    2012
  • fDate
    9-11 May 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    GaAs monolithic microwave integrated circuit switch (MMIC SW) for cellular phones and WLAN are required to be smaller. The chip size can be smaller using a high-resistance thin film resistor (HR-TFR) because the resistance of the gate-resistor for the SW is very large. ZrN is thought to be one of the most promising materials for HR-TFRs. However, the ZrN TFRs have a thermal stability problem. In this study, we investigated the effect of thermal annealing on the ZrN film to improve the thermal stability. We found oxidized bumps in the ZrN TFR that are formed at the contact edge between the ZrN TFR and the electrode reduced the stability of the ZrN TFR. With an appropriate annealing condition, these oxidized bumps are suppressed and the stability of the ZrN TFR is improved. We developed a stable HR ZrN TFR of approximately 4000Ω/sq. to fulfill design requirements. We made the chip about 30% smaller in case of a single pole double throw (SPDT) MMIC SW for WLAN applications with the ZrN TFR.
  • Keywords
    III-V semiconductors; MMIC; annealing; cellular radio; gallium arsenide; microwave switches; oxidation; thermal stability; thin film resistors; wireless LAN; zirconium compounds; HR-TFR; MMIC switch; SPDT MMIC SW; WLAN; annealing condition; cellular phones; chip size; contact edge; design requirements; gate-resistor; high-resistance thin film resistor; monolithic microwave integrated circuit switch; oxidized bumps; single pole double throw MIMIC SW; thermal annealing; thermal stability problem; Annealing; Electrodes; MMICs; Resistance; Resistors; Thermal stability; Wireless LAN; MMIC; TFR; ZrN; oxidation; reliability; switch;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for
  • Conference_Location
    Osaka
  • Print_ISBN
    978-1-4673-0837-3
  • Type

    conf

  • DOI
    10.1109/IMFEDK.2012.6218584
  • Filename
    6218584