DocumentCode :
2333351
Title :
Gas-puff Z-pinch on pulsed power generator with self-crowbar switch
Author :
Akiyama, Hidenori ; Shimomura, Naoharu ; Takasugi, K. ; Miyamoto, Takahiro ; Sato, Mitsuhisa ; Tazima
Author_Institution :
Dept. of Electr. Eng., Kumamoto Univ., Japan
fYear :
1989
fDate :
0-0 1989
Firstpage :
105
Lastpage :
106
Abstract :
Summary Form only given, as follows. Recent developments in pulsed power technology have increased interest in gas-puff Z-pinches as soft X-ray sources and for nuclear fusion. The pulse width of the pulsed power is extremely short, i.e. several tens of nanosecond, in comparison with the pulse width of the fast bank. Therefore, high current density is necessary to realize pinch phenomena within the pulse width. A self-crowbar switch that can be used to produce a slightly larger pulse has been proposed and tested. Experiments using the LIMAY-1 pulsed power generator are reported. The maximum stored energy, the output voltage, the pulse width, and the characteristic impedance are 13 kJ, 600 kV, 70 ns, and 3 Omega , respectively. The discharge starts at radial positions between 8 and 15 mm, after the Ar gas is injected. Then the pinch of the annular plasma occurs. The cathode and anode configurations have significant effects on the development of a homogeneous annular plasma. The discharges are grouped into four kinds of phenomena: vacuum discharges, Z-pinches without and with self-crowbar switches, and no Z-pinch with self-crowbar switches.<>
Keywords :
X-ray production; pinch effect; plasma switches; power supplies to apparatus; pulsed power technology; 13 kJ; 3 ohm; 600 kV; 70 ns; Ar gas; LIMAY-1 pulsed power generator; characteristic impedance; gas-puff Z-pinches; homogeneous annular plasma; maximum stored energy; output voltage; pinch; pulse width; self-crowbar switch; soft X-ray sources; vacuum discharges; Plasma pinch; Power supplies; Pulse power systems; X-ray production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166142
Filename :
166142
Link To Document :
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