DocumentCode
2334080
Title
VLSI circuits degradation due to ESD stress below ESD rating voltage
Author
Lisenker-Touber, Boris
Author_Institution
Tower Semicond. Ltd., Migdal Haemek, Israel
fYear
1995
fDate
7-8 March 1995
Abstract
This paper examines low level damage due to ESD stress below ESD rating on one-micron n-well CMOS VLSI circuits and on an NMOSFET. Different VLSI products with different ESD protection circuits were tested using a new method, proposed for latency phenomenon investigation. It is clearly ascertained that ESD stress below ESD rating causes latency damage in VLSI circuits independent of the ESD protection circuit performance. The results obtained on an NMOSFET allow to explain many in-circuits degradations caused by low-level ESD events.
Keywords
CMOS integrated circuits; MOSFET; VLSI; electrostatic discharge; failure analysis; integrated circuit reliability; integrated circuit testing; protection; ESD protection circuits; ESD rating voltage; ESD stress; NMOSFET; VLSI circuits degradation; low level damage; n-well CMOS VLSI circuits; Circuit testing; Degradation; Delay; Dielectric substrates; Electrostatic discharge; MOSFET circuits; Protection; Stress; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical and Electronics Engineers in Israel, 1995., Eighteenth Convention of
Conference_Location
Tel Aviv, Israel
Print_ISBN
0-7803-2498-6
Type
conf
DOI
10.1109/EEIS.1995.513838
Filename
513838
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