• DocumentCode
    2334080
  • Title

    VLSI circuits degradation due to ESD stress below ESD rating voltage

  • Author

    Lisenker-Touber, Boris

  • Author_Institution
    Tower Semicond. Ltd., Migdal Haemek, Israel
  • fYear
    1995
  • fDate
    7-8 March 1995
  • Abstract
    This paper examines low level damage due to ESD stress below ESD rating on one-micron n-well CMOS VLSI circuits and on an NMOSFET. Different VLSI products with different ESD protection circuits were tested using a new method, proposed for latency phenomenon investigation. It is clearly ascertained that ESD stress below ESD rating causes latency damage in VLSI circuits independent of the ESD protection circuit performance. The results obtained on an NMOSFET allow to explain many in-circuits degradations caused by low-level ESD events.
  • Keywords
    CMOS integrated circuits; MOSFET; VLSI; electrostatic discharge; failure analysis; integrated circuit reliability; integrated circuit testing; protection; ESD protection circuits; ESD rating voltage; ESD stress; NMOSFET; VLSI circuits degradation; low level damage; n-well CMOS VLSI circuits; Circuit testing; Degradation; Delay; Dielectric substrates; Electrostatic discharge; MOSFET circuits; Protection; Stress; Very large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical and Electronics Engineers in Israel, 1995., Eighteenth Convention of
  • Conference_Location
    Tel Aviv, Israel
  • Print_ISBN
    0-7803-2498-6
  • Type

    conf

  • DOI
    10.1109/EEIS.1995.513838
  • Filename
    513838