Title :
Analysis of parasitic resistance in double gate FinFETs with different fin lengths
Author :
Yang, X. ; Maitra, K. ; Yeh, C. ; Zeitzoff, P. ; Raymond, M. ; Kulkarni, P. ; Wang, M. ; Yamashita, T. ; Basker, V.S. ; Standaert, T.E. ; Samavedam, S. ; Bu, H. ; Miller, R.J.
Author_Institution :
GLOBALFOUNDRIES Inc., Albany, NY, USA
Abstract :
A significant increase in parasitic resistance (RPARA) fluctuation is observed when S/D length is getting smaller than the characteristic length (LTRANS). Resistance change evaluated on double gate finFETs with various fin lengths shows an excellent agreement between the experimental data and the analytical model. Further RPARA fluctuation improvement can be realized by optimizing the LTRANS.
Keywords :
MOSFET; S-D length; double gate FinFET; fin length; parasitic resistance fluctuation analysis; Analytical models; Electrical resistance measurement; FinFETs; Fluctuations; Logic gates; Resistance;
Conference_Titel :
SOI Conference (SOI), 2011 IEEE International
Conference_Location :
Tempe, AZ
Print_ISBN :
978-1-61284-761-0
Electronic_ISBN :
1078-621X
DOI :
10.1109/SOI.2011.6081799