P1M-4 Study on Formation Mechanism of (1120) Textured ZnO Films

Author

Kawamoto, Takayuki ; Matsukawa, Mami ; Watanabe, Yoshiaki ; Yanagitani, Takahiko

Author_Institution

Fac. of Eng., Doshisha Univ., Kyoto

fYear

2006

fDate

2-6 Oct. 2006

Firstpage

1529

Lastpage

1532

Abstract

The ZnO films where crystallites c-axis are unidirectionally aligned in the substrate plane ((112macr0) textured ZnO films) realize shear mode devices. In this study, we have studied the formation mechanism of the (112macr0) textured ZnO film, focusing on the effect of total pressure and partial pressure of oxygen and argon during sputtering deposition. In addition to the X-ray diffraction (XRD) measurement of the films, optical emissions from the RF plasma were analyzed to investigate the effect of ionic species on the growth of the ZnO films. Highly crystallized (112macr0) textured ZnO films were obtained in conditions of low total gas pressure and high oxygen concentration. In these conditions, strong optical emission spectra from oxygen species were strongly observed. The best shear mode electromechanical coupling coefficient k₁₅ of the film was 0.16, which was 62 % of the value of single crystal

Keywords

X-ray diffraction; crystal structure; luminescence; piezoceramics; piezoelectric thin films; sputter deposition; ultrasonic applications; ultrasonics; zinc compounds; RF plasma; X-ray diffraction; XRD; ZnO; argon partial pressure; argon total pressure; crystallized textured ZnO films; optical emission spectra; optical emissions; oxygen partial pressure; oxygen total pressure; shear mode devices; shear mode electromechanical coupling coefficient; sputtering deposition; substrate plane; textured zinc oxide film formation; unidirectional crystal; Argon; Crystallization; Optical diffraction; Optical films; Plasma measurements; Sputtering; Stimulated emission; Substrates; X-ray diffraction; Zinc oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Ultrasonics Symposium, 2006. IEEE

Conference_Location

Vancouver, BC

ISSN

1051-0117

Print_ISBN

1-4244-0201-8

Electronic_ISBN

1051-0117

Type

conf

DOI

10.1109/ULTSYM.2006.388

Filename

4152244