• DocumentCode
    235663
  • Title

    Chemical mechanical properties of perovskite oxide abrasive grain: First-principles approach

  • Author

    Ozawa, Nobuki ; Higuchi, Yuji ; Kubo, Momoji

  • Author_Institution
    Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2014
  • fDate
    19-21 Nov. 2014
  • Firstpage
    203
  • Lastpage
    204
  • Abstract
    To elucidate the chemical mechanical polishing (CMP) performance of perovskite oxide abrasive grain for glass, we investigated electronic states of CaZrO3 and SrFeO3 by the first-principles calculation. The calculation results show that the Zr and Fe atoms in CaZrO3 and SrFeO3 take low valence states. We suggest that the metal atoms in perovskite oxide are effective for the glass polishing since low-valent metal atoms can weaken the Si-O bond of the glass surface by electron donation based on our reported CMP mechanism of glass by CeO2 abrasive grains.
  • Keywords
    ab initio calculations; abrasion; calcium compounds; chemical mechanical polishing; strontium compounds; CaZrO3; SrFeO3; chemical mechanical polishing; chemical mechanical properties; electron donation; electronic states; first-principles calculation; glass polishing; low-valent metal atoms; perovskite oxide abrasive grain; valence states; Abrasives; Chemicals; Crystals; Glass; Iron; Zirconium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2014 International Conference on
  • Conference_Location
    Kobe
  • Print_ISBN
    978-1-4799-5556-5
  • Type

    conf

  • DOI
    10.1109/ICPT.2014.7017280
  • Filename
    7017280