DocumentCode
235663
Title
Chemical mechanical properties of perovskite oxide abrasive grain: First-principles approach
Author
Ozawa, Nobuki ; Higuchi, Yuji ; Kubo, Momoji
Author_Institution
Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear
2014
fDate
19-21 Nov. 2014
Firstpage
203
Lastpage
204
Abstract
To elucidate the chemical mechanical polishing (CMP) performance of perovskite oxide abrasive grain for glass, we investigated electronic states of CaZrO3 and SrFeO3 by the first-principles calculation. The calculation results show that the Zr and Fe atoms in CaZrO3 and SrFeO3 take low valence states. We suggest that the metal atoms in perovskite oxide are effective for the glass polishing since low-valent metal atoms can weaken the Si-O bond of the glass surface by electron donation based on our reported CMP mechanism of glass by CeO2 abrasive grains.
Keywords
ab initio calculations; abrasion; calcium compounds; chemical mechanical polishing; strontium compounds; CaZrO3; SrFeO3; chemical mechanical polishing; chemical mechanical properties; electron donation; electronic states; first-principles calculation; glass polishing; low-valent metal atoms; perovskite oxide abrasive grain; valence states; Abrasives; Chemicals; Crystals; Glass; Iron; Zirconium;
fLanguage
English
Publisher
ieee
Conference_Titel
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location
Kobe
Print_ISBN
978-1-4799-5556-5
Type
conf
DOI
10.1109/ICPT.2014.7017280
Filename
7017280
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