Title :
Consideration of reactors configuration for NOx treatment by nanosecond pulsed power
Author :
Shimomura, N. ; Nakano, K. ; Nakajima, H. ; Kageyama, T. ; Teranishi, K. ; Akiyama, H.
Author_Institution :
Inst. of Technol. & Sci., Univ. of Tokushima, Tokushima, Japan
Abstract :
Nitrogen oxides (NOx) are one of the air pollutants that cause acid rain. Although utilization of catalysts is a typical established method of treatment to remove NOx, the catalyst is so expensive that the cost of treatment is high. The efficient treatments using pulsed power, which utilize the pulse streamer discharges, have been studied. We have brought the nanosecond pulsed power to the NOx treatment. More efficient treatment is expected with the high electric fields with a nanosecond pulse width. In using the nanosecond pulsed power, the issue of design and modification of reactors configuration becomes significant. The matching of reactor to the generator output is strict and the behaviors of discharges in the reactors as an electrical circuit are complicated. The reactors with coaxial electrodes were basically adopted and the removal ratios and the efficiencies were evaluated on various reactor configurations, in order to optimize the reactors configuration. The number, connecting method of the reactor chambers and of gas tubing was investigated to improve treatment efficiency in the experiment.
Keywords :
air pollution control; catalysts; chemical reactors; discharges (electric); pulse generators; pulsed power technology; NOx; acid rain; air pollutants; catalysts; coaxial electrodes; electrical circuit; gas tubing; high electric fields; nanosecond pulse width; nanosecond pulsed power; nitrogen oxide removal; pulse streamer discharges; pulsed power treatment; reactor chambers; reactor configuration; Discharges; Electrodes; Fluid flow; Generators; Inductors; Joining processes; Nitrogen; NOx treatment; nanosecond pulsed power; nitrogen oxides; streamer discharge;
Conference_Titel :
Power Modulator and High Voltage Conference (IPMHVC), 2010 IEEE International
Conference_Location :
Atlanta, GA
Print_ISBN :
978-1-4244-7131-7
DOI :
10.1109/IPMHVC.2010.5958453