• DocumentCode
    236052
  • Title

    Reactive ion etching processes for Nb/NbxSi1−x/Nb Josephson junction arrays

  • Author

    Yuan Zhong ; Jinjin Li ; Wenhui Cao ; Yonggang Liu ; Qing Zhong ; Xueshen Wang

  • Author_Institution
    Nat. Inst. of Metrol., Beijing, China
  • fYear
    2014
  • fDate
    24-29 Aug. 2014
  • Firstpage
    118
  • Lastpage
    119
  • Abstract
    Reactive ion etching (RIE) is a common tool in micro- and nano-scale device fabrication. This paper presents experimental results of using the RIE tool to etch different films in Nb/NbxSi1-x/Nb Josephson junction array fabrication process in NIM.
  • Keywords
    measurement standards; microfabrication; nanofabrication; niobium; niobium compounds; sputter etching; superconducting arrays; superconducting junction devices; voltage measurement; Josephson junction array fabrication process; NIM; Nb-NbxSi1-x-Nb; PJVS; RIE tool; microscale device fabrication; nanoscale device fabrication; programmable Josephson voltage standards; reactive ion etching process; Etching; Fabrication; Films; Josephson junctions; Junctions; Niobium; Standards; ICP; Josephson junctions; RIE; dry etch;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
  • Conference_Location
    Rio de Janeiro
  • ISSN
    0589-1485
  • Print_ISBN
    978-1-4799-5205-2
  • Type

    conf

  • DOI
    10.1109/CPEM.2014.6898287
  • Filename
    6898287
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=236052