Surface layer analysis of Si sphere by XRF and XPS

Author

Lulu Zhang ; Azuma, Yasushi ; Kurokawa, Akira ; Kuramoto, Naoki ; Fujii, Kenichi

Author_Institution

Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Nat. Metrol. Inst. of Japan (NMIJ), Tsukuba, Japan

fYear

2014

fDate

24-29 Aug. 2014

Firstpage

208

Lastpage

209

Abstract

To reduce the uncertainty of the Avogadro constant for the new definition of the kilogram, the surface analysis of the Si sphere produced for the accurate determination of the Avogadro constant is indispensable. In this work, we conducted the surface quantitative analysis to find out the metallic contaminations of a Si sphere by x-ray fluorescence (XRF) spectroscopy. The x-ray photoelectron spectroscopy (XPS) investigations were also carried out to estimate the thickness of the oxide layer and clarify the chemical binding state of the carbonaceous contamination layer on the surface of a dummy Si sphere.

Keywords

X-ray fluorescence analysis; X-ray photoelectron spectra; constants; elemental semiconductors; measurement uncertainty; metallic thin films; silicon; surface contamination; thickness measurement; Avogadro constant uncertainty; X-ray fluorescence spectroscopy; X-ray photoelectron spectroscopy; XPS; XRF; carbonaceous contamination layer; chemical binding state; kilogram; metallic contamination; surface analysis; surface layer analysis; surface quantitative analysis; thickness estimation; Calibration; Iterative closest point algorithm; Nickel; Silicon; Statistical analysis; Surface contamination; Silicon; chemical analysis; surface contamination; thickness measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on

Conference_Location

Rio de Janeiro

ISSN

0589-1485

Print_ISBN

978-1-4799-5205-2

Type

conf

DOI

10.1109/CPEM.2014.6898332

Filename

6898332